ADVANCED TECHNOLOGY (MS)
The M.S. in Advanced Technology is a course-based, advanced degree program designed for professionals who want to expand their knowledge, learn new skills, and advance their careers in the semiconductor and other advanced manufacturing industries. Focusing on the enabling technologies for semiconductor processing and nanomanufacturing, this pioneering program uses an applied learning approach that is centered on cutting edge patterning, fabrication, metrology, and device characterization methods for current and next-generation high volume manufacturing of nanoelectronics. Students in the program get unparalleled education from our world-class faculty and benefit from taking classes at SUNY Poly’s Albany Nanotech Complex, where the program leverages the on-site process flow development activities and resources.
The overarching structure of the Semiconductor Processing and Nanomanufacturing Technology focus encompasses the design and development of process flows for advanced design rules, material sets, and device architectures at its core. Designated electives allow our students to delve further into specific subjects, such as metrology and process control, reliability, lithography, data analytics, optoelectronics, or photonics. The coursework will be aptly supplemented with actual case studies that will teach systematic problem solving methodologies for yield and process issues. A step-by-step approach to following an industry-relevant ReRAM flow will provide hands-on experience in lot tracking and inspection practices over multiple process sectors including lithography, etch & CMP.
Campus Information
Albany
SUNY Poly’s Albany NanoTech Complex, a 1.65 million-square-foot megaplex with the only fully-integrated, 300mm computer chip pilot prototyping and demonstration lines within 135,000 square feet of Class 1 capable cleanrooms. Unmatched nanotechnology-centered educational resources and capabilities provide the foundation for New York’s burgeoning Tech Valley.
Intakes
- Feb
- Aug
Application Processing Time in Days: 25
Minimum English Language Requirements
| English Level Description | IELTS (1.0 -9.0) | TOEFL IBT (0-120) | TOEFL CBT (0-300) | PTE (10-90) | |
|---|---|---|---|---|---|
| Expert | 9 | 120 | 297-300 | 86-90 | |
| Very Good | 8.5 | 115-119 | 280-293 | 83-86 | |
| Very Good | 8 | 110-114 | 270-280 | 79-83 | |
| Good | 7.5 | 102-109 | 253-267 | 73-79 | |
| Good | 7 | 94-101 | 240-253 | 65-73 | |
| Competent | 6.5 | 79-93 | 213-233 | 58-65 | |
| Competent | 6 | 60-78 | 170-210 | 50-58 | |
| Modest | 5.5 | 46-59 | 133-210 | 43-50 | |
| Modest | 5 | 35-45 | 107-133 | 36-43 | |
| Limited | 4 | 32-34 | 97-103 | 30-36 | |
| Extremely Limited | < 4 | < 31 | < 93 | < 30 |
Job Opportunity Potential
Thank you for your interest in pursuing a career with the State University of New York Polytechnic Institute (SUNY Poly). SUNY Poly represents a new and necessary model for public and affordable higher education in science, engineering, and technology; one that is cognizant and respectful of the customary academic enterprise, while fostering and enabling the fast evolving culture of discovery and innovation in today’s knowledge-driven global economy. SUNY Poly supports accelerated high technology education and commercialization, and seeks to create jobs and economic growth for nanotechnology-related industries.
Pursuant to University policy, the University is committed to fostering a diverse community of outstanding faculty, staff, and students, as well as ensuring equal educational opportunity, employment, and access to services, programs, and activities, without regard to an individual's race, color, national origin, religion, creed, age, disability, sex, gender identity, sexual orientation, familial status, pregnancy, predisposing genetic characteristics, military status, domestic violence victim status, or criminal conviction. Employees, students, applicants or other members of the University community (including but not limited to vendors, visitors, and guests) may not be subjected to harassment that is prohibited by law, or treated adversely or retaliated against based upon a protected characteristic.
The University’s policy is in accordance with federal and state laws and regulations prohibiting discrimination and harassment. These laws include the Americans with Disabilities Act (ADA), Section 504 of the Rehabilitation Act of 1973, Title IX of the Education Amendments of 1972, Title VII of the Civil Rights Act of 1964 as Amended by the Equal Employment Opportunity Act of 1972, and the New York State Human Rights Law. These laws prohibit discrimination and harassment, including sexual harassment and sexual violence.
PSW Opportunity
3Yrs of PSW
Admission Requirement / Eligibility Criteria
English Language Proficiency
All international applicants to the Utica campus must demonstrate English language proficiency by achieving one of the minimum scores noted below from one of the following standardized exams:
Test of English as a Foreign Language (TOEFL): Internet based score of 79
International English Language Testing System (IELTS): Overall band score of 6.5
PTE Academic (PTE): Overall score of 53
Duolingo English Test (DET): Total score of 105
- Course Type: Full Time
- Course Level: Masters/PG Degree
- Duration: 01 Year
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Total Tuition Fee:
34650 USD
Annual Cost of Living: 12000 USD
Application Fee: 50 USD