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Istituto Secoli

Milano , Milano ,Italy

Diploma in INTENSIVE PATTERNMAKING WOMEN'S WEAR

 

Advanced and intensive course of patternmaking and garment sewing during which students learn the "Secoli Method" of pattern construction for WOMEN'S WEAR, the industrial sewing techniques of prototypes and the use of the latest CAD patternmaking software release.

What are the work opportunities

At the end of the pathway graduates will be able to work in the technical design phase of a women's clothing collection, both as a freelance and as an employee in industries, services or craft companies. In particular in all those professions related to the patternmaking office (patternmaker, CAD patternmaker); the prototype departments (prototype’s tailor) and the tailoring department (dressmaker).

Main subject

- Women’s wear patternmaking
- Sewing of women’s wear prototypes
- CAD patternmaking

Intakes

  • Sep Deadline: June

Application Processing Time in Days: 30

Application Process

Reply application/materials
7 Days
Evaluate
7 Days
Skype Interview
1 Days
Admission letter
10 Days

Minimum English Language Requirements

English Level Description IELTS (1.0 -9.0) TOEFL IBT (0-120) TOEFL CBT (0-300) PTE (10-90)
Expert 9 120 297-300 86-90
Very Good 8.5 115-119 280-293 83-86
Very Good 8 110-114 270-280 79-83
Good 7.5 102-109 253-267 73-79
Good 7 94-101 240-253 65-73
Competent 6.5 79-93 213-233 58-65
Competent 6 60-78 170-210 50-58
Modest 5.5 46-59 133-210 43-50
Modest 5 35-45 107-133 36-43
Limited 4 32-34 97-103 30-36
Extremely Limited < 4 < 31 < 93 < 30

Admission Requirement / Eligibility Criteria

- College qualification (high school diploma) - Good patternmaking and sewing knowledge acquired either completing higher education studies or other subject specific courses or through the work experiences.

  • Course Type: Full Time
  • Course Level: Post Graduate Diploma or Certificate
  • Duration: 01 Year  
  • Total Tuition Fee: 10000 EUR
    Annual Cost of Living: 12000 EUR
    Application Fee: 2000 EUR
This Institution is not directly represented by us and applications / visa support (to them) attract a nominal charge